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ZESTRON to Showcase ATRONR AC 207 at NEPCON Shanghai 2011


05/09/2011

Manassas, VA - May 5, 2011 - ZESTRON, the worldwide leading provider of high precision cleaning products and services for the electronics manufacturing industry, will exhibit ATRON® AC 207 as well as the company’s complete line of process solutions at NEPCON Shanghai held at the Everbright Convention & Exhibition Center from May 11-13, 2011(booth #2C01).

 
ATRON® AC 207 is a FAST® Technology-based surfactant PCB cleaner, specifically designed to provide a superior level of material compatibility with sensitive metals. With a bath life that is 3 to 10 times longer than that of traditional surfactants, ATRON® AC 207 offers excellent cleaning results in high and medium pressure inline as well as batch cleaning systems at low concentrations and temperatures.  It removes a wide variety of the latest lead-free and eutectic flux residues as well as unsoldered solder pastes. 
 
FAST® (Fast Acting Surfactant Technology) is an innovative surfactant-based cleaning technology developed and introduced by ZESTRON in 2007. FAST® Technology based cleaning agents contain a proprietary mix of newly developed surfactants, which allow for a quicker removal of a wide variety of the latest lead-free and leaded flux residues.
 
For more information about ATRON® AC 207 as well as ZESTRON’s extensive line of products and services, please visit ZESTRON’s booth #2C01. Our sales and engineering team stands ready to answer any questions you may have.  To register for the show, please visit http://www.nepconchina.com/en/Homepage/.
 
About ZESTRON:
 
Headquartered in Manassas, Virginia and operating in over 35 countries, ZESTRON is the leading global provider of precision cleaning products and services. For over 20 years, ZESTRON has created products to help its customers achieve success. Today, with the largest team of chemical engineers in the industry, ZESTRON leverages comprehensive capabilities to ensure customers surpass even the most stringent cleaning and vapor recovery requirements.
 

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